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ARTICLE · 12 AUGUST 2021

ALJ Shaw Issues Initial Determination In Certain Chemical Mechanical Planarization Slurries (337-TA-1204)

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On August 6, 2021, ALJ David P. Shaw released the public version (see Part I, Part II, Part III, Part IV) of his July 8, 2021 final initial determination ("ID")...

United StatesIntellectual Property
Oblon, McClelland, Maier & Neustadt, L.L.P
Oblon, McClelland, Maier & Neustadt, L.L.P
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On August 6, 2021, ALJ David P. Shaw released the public version (see  Part I, Part II, Part III, Part IV) of his July 8, 2021 final initial determination ("ID") in Certain Chemical Mechanical Planarization Slurries and Components Thereof (Inv. No. 337-TA-1204) finding a violation of section 337.

By way of background, the Commission instituted this investigation on July 7, 2020 based on a complaint filed by Cabot Microelectronics Corporation of Aurora, Illinois ("CMC") alleging violations of section 337 by Respondents DuPont de Nemours, Inc. of Wilmington, Delaware; Rohm and Haas Electronic Materials CMP Inc. of Newark, Delaware; Rohm and Haas Electronic Materials CMP Asia Inc. (d/b/a Rohm and Haas Electronic Materials CMP Asia Inc., Taiwan Branch (U.S.A.)) of Taiwan; Rohm and Haas Electronic Materials Asia-Pacific Co., Ltd. of Taiwan; Rohm and Haas Electronic Materials K.K. of Japan; and Rohm and Haas Electronic Materials LLC of Marlborough,

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